Photomask Japan is an international symposium and technical exhibition on photomasks and lithography in Japan. The aim of the symposium is to bring together engineers and investigators from all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and panel discussions. Photomask Japan is an ideal chance to introduce the equipment in connection with photomask technology, parts, material and software.
The 25th fair anniversary of the Photomask Japan takes place on 3, Wed. in 18.04.2018.